Ascent AP Series

Product details

Unprecedented Power Control for Single- and Dual-Magnetron Sputtering

Achieve new levels of process performance using field-proven, bipolar DC pulsing technology.

  • Advanced waveform control allows process fine-tuning
  • Available for both dual-pulsed and single-pulsed magnetron sputtering applications
  • Compact design incorporates DC and pulsing


Datasheet